Incorporating leading-edge mask technology, powerful parallel distributed processing, variety of boolean operations and sliver control functions, MaskStudio responds to your demands for high-quality and high-performance mask-data processing.

Fast Conversion Speed

MaskStudio's efficient parallel distributed processing mechanism can reduce the time it takes for conversion almost to the theoretical figure according to the increase in the parallel count. MaskStudio already has achieved good results with 200 parallel counts making it possible to handle data that will definitely become large in the future.

Multi-format Support

The following file formats are supported. 

• (Input)

  GDSII	Version 5/ 6/ 7
  OASIS	1.0
  JEOL52	V1.0/ V2.1/ V3.0/ V3.1/ JOB
  MEBES	RETICLE/ MODE5/JOB（*）
  Hitachi	HL800/ HL900/ HL7000/ JOB
  Toshiba/NuFlare Tech.	VSB11/ VSB12/ JOB
  LAVIS	PILOT
  USER	USER-Format

• (Output)

  GDSII	Version 7
  OASIS	1.0
  JEOL52	V1.0/ V2.1/ V3.0/ V3.1
  MEBES	RETICLE/ MODE5
  Hitachi	HL800/ HL900/ HL7000
  Toshiba/NuFlare Tech.	VSB11/ VSB12

   (*) MEBES file cannot be converted to a file other than MEBES.

Multi-platform Support

The following platforms are supported.                                 
The machines of different architectures may be used to configure a cluster.

    Sun SPARC Solaris 9, 10 (64-bit)
    RedHat Enterprise Linux WS/ES/AS 3, 4

User-friendly GUI

MaskStudio offers a GUI to display job entries and their progresses. Job statuses can easily and visually be checked on the screen making it possible to predict when will each job be complete and lets you schedule when to use the generated data in the subsequent process.
In addition, since the RuleEditor to interactively create a rule file, which is a file required for conversion, is equipped with MaskStudio, various functions of MaskStudio can easily be used even from the first startup.

Huge and Complex Data Handling

MaskStudio divides data and compresses its size according to the specified output file format. Moreover, in order to handle large size files, compressed data can be processed without being expanded.
As process node continues to shrink, it is very important for fracturing systems to have both high-speed and accurate output performance. MaskStudio suppresses slivers that could lead to accuracy degradation from being generated by original sliver control technique. 

MRC Function

MRC function that allows you to check to see if an e-beam converted from an OPCed data includes any manufacturing-related defects. The MRC may be performed separately, or in parallel with e-beam conversion and will prevent problems in the subsequent process from being occurred.

Integration with Other Vendors' Tools

MaskStudio allows you to execute our LAVIS, a layout visualization platform, as well as other vendor's tool internally and batch process the related operations in one process.