October 2008 - Photomask Technology 2008 Report

We would like to thank you for visiting our booth at "Photomask Technology 2008", held in Monterey. It is our pleasure and honor that the exhibition was successfully conducted.

In the exhibition, we introduced and demonstrated the latest version of MaskStudio and the new product MS-lite. With the start of MS-lite sales, the two products now offer different aspects for the fracturing solution.

We plan to update and improve the features of both "MaskStudio" and "MS-lite", so please keep your eye on the subsequent version update.

Among our product lineup, LAVIS, the layout visualization platform, is also available.

Should you have any question or request, please feel free to contact us.

TOOL at Photomask Technology 2008

TOOL Booth

Presentation