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June 2002 - Layout Viewer LAVIS Version 2.0 released


TOOL CORPORATION has released Version 2.0 of the TOOL-developed next-generation layout viewer LAVIS. This layout viewer is compatible with multiple formats, LAVIS displays large-scaled LSI layout data at ultrahigh speeds. Since its release in September 2001, LAVIS has assisted leading device manufacturers and has been utilized as an indispensable tool. LAVIS Version 2.0 has been rolled out for providing expanded functions and range. Major expanded functions of Version 2.0 for LAVIS are described below.

Improved availability in design environments

  • GDS library/merge function

  • In many cases, layouts are designed by module in different environments (by tool and team). In such a case, two or more GDS files need to be merged beforehand. The new additional GDS library function and GDS file unifying function allow GDS files to be merged and displayed at high speed on the LAVIS even if data is divided into different files by module and library. This makes it possible to reduce time and resources (disks) substantially.
  • Interface with Caribre-RVE

  • Larger design data increases the percentage of the layout examination process in the whole design procedure. A higher level of efficiency in the process has as much to do with improvement of TAT in the entire design process. Now LAVIS can be connected to the Caribre-RVE of Mentor Graphics Corporation. Clicking on an erroneous portion on the RVE side leads to automatic zoom-up of a corresponding portion in the layout data, thus making it possible to highlight error-containing graphics and equipotential graphics. Using LAVIS with the Caribre-RVE allows interactive error analyses. The function of LAVIS to display data at high speeds makes it possible to reduce analysis time substantially.

Application to mask production process

LAVIS supports GDS forms and all other EB formats that are currently in use. The new additional functions allows LAVIS to read job deck files of individual EB drawing units including MEBES, JEOL, and HL files. LAVIS has been thus far utilized in fields ranging from design data to EB data production processes. These new expanded functions also allow the application of LAVIS in mask production processes. This makes it possible to use common viewing environments in fields ranging from designing to mask production to improve the availability of LAVIS.

Full platform support

Besides SPARC/Solaris and HP-UX, LAVIS is also compatible with other platforms, Windows and Linux. LAVIS can therefore be used with all the main platforms in current operation, and data can be displayed in all environments. You can look up data at your desk with ease and so can others in addition to designers, thus eliminating the need for any dedicated EWS.

Many additional and improved functions

Besides the functions mentioned above, other functions and performance have been added and improved. For more information, refer to the additional functions of version 2.0 for LAVIS.

Future developments

Interfaces with other tools, additional reading formats, and additional platforms allow LAVIS to have a wider range of applications. TOOL CORPORATION plans to continue to expand LAVIS compatibility with the increasing formats through further tie-ups with other leading tool manufacturers and systems along with providing the provision of various interfaces.
TOOL CORPORATION will continue to further develop and provide LAVIS as a standard layout viewer through provision of a consistent viewing environment ranging from design, production, inspection and measurement including the provision of viewing environments at remote places via networks.

* Specific names used herein are trade names.